Research Article

Self-Healing Photocurable Epoxy/thiol-ene Systems Using an Aromatic Epoxy Resin

Figure 4

Comparison of the kinetic profiles of the epoxy groups during the photopolymerization of DGEBA with varying concentrations of the thiol-ene system. The photopolymerizations were performed at a temperature of 85°C and UV light intensity of 40 mW/cm2. The photoinitiator DMPA and the catalyst TBP were added at 1%.