Research Article
The Effect of Yttrium Addition on the Microstructures and Electrical Properties of CuMn Alloy Thin Films
Figure 5
CuMn film TEM micrographs with 19.6 at.% Y addition annealed at 350°C: (a) cross-section bright field, (b) selected-area electron diffraction, (c) SAD analysis, and (d) HRTEM micrographs.
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