Research Article
A Study on the Wear Characteristics of Al7075 with Changes in Surface Roughness and Ti Thin Film Deposition Time
Table 2
Sputtering conditions for thin film deposition.
| Film material | Ti |
| DT (deposition time) | 30′, 60′, 90′ | Base vacuum (torr) | 5.0 × 10 ^- 6 | Working vacuum (torr) | 2.0 × 10 ^ 3 | Plasma factor (w) | 200 | Temperature | RT |
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