Research Article

A Study on the Wear Characteristics of Al7075 with Changes in Surface Roughness and Ti Thin Film Deposition Time

Table 2

Sputtering conditions for thin film deposition.

Film materialTi

DT (deposition time)30′, 60′, 90′
Base vacuum (torr)5.0 × 10 ^- 6
Working vacuum (torr)2.0 × 10 ^ 3
Plasma factor (w)200
TemperatureRT