Advances in Materials Science and Engineering / 2010 / Article / Fig 4

Research Article

Retention Characteristics of CBTi144 Thin Films Explained by Means of X-Ray Photoemission Spectroscopy

Figure 4

(a) A plan-view TEM micrograph and (b) Selected area diffraction (SAD) pattern for CBTi144 film deposited by the soft chemical method at 700 C for 2 hours.
710269.fig.004a
(a)
710269.fig.004b
(b)

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