Retention Characteristics of CBTi144 Thin Films Explained by Means of X-Ray Photoemission Spectroscopy

<table>P-V hysteresis loop for CBTi144 thin film deposited on (100) Pt/Ti/SiO<sub>2</sub>/Si substrate at 700<svg height="12.9375" id="M18" style="vertical-align:-0.0pt" version="1.1" viewbox="0 0 5.1624999 12.9375" width="5.1624999" xmlns="http://www.w3.org/2000/svg" xmlns:xlink="http://www.w3.org/1999/xlink">
<g transform="matrix(.012,-0,0,-.012,.062,4.712)"><path d="M326 255q0 -56 -41 -96t-99 -40t-99 40t-41 96t41 96t99 40t99 -40t41 -96zM274 255q0 38 -25.5 65t-62.5 27t-62.5 -27t-25.5 -65t25.5 -65t62.5 -27t62.5 27t25.5 65z" id="x2218"></path></g>
</svg>C for 2 hours.</table>

Advances in Materials Science and Engineering

fig6

Figure 6

Figure 6: Retention Characteristics of CBTi144 Thin Films Explained by Means of X-Ray Photoemission Spectroscopy 