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Advances in Materials Science and Engineering
Volume 2012 (2012), Article ID 923769, 7 pages
http://dx.doi.org/10.1155/2012/923769
Research Article

Characteristics and Photocatalytic Properties of T i O 2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation

1Department of Electrical Engineering, Faculty of Engineering, Kogakuin University, 2665-1, Nakano-machi, Hachioji-shi, Tokyo 192-0015, Japan
2Division of Basic Liberal Arts, Kogakuin University, 2665-1, Nakano-machi, Hachioji-shi, Tokyo 192-0015, Japan
3Tokyo Metropolitan Industrial Technology Research Institute, 3-13-10, Nishigaoka, Kitaku, Tokyo 115-8586, Japan

Received 30 June 2011; Revised 5 September 2011; Accepted 12 September 2011

Academic Editor: Koumei Baba

Copyright © 2012 Haider A. Shukur et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Abstract

TiO2 thin films of a rutile, an anatase, and a mixture type with anatase and rutile were fabricated by a magnetron sputtering method. The fabricated films were irradiated by N+ ions with several doses using the Freeman ion source. Atomic force microscopy (AFM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and UV-VIS spectrophotometer were employed to investigate morphology, structure, chemical state, and optical characteristics, respectively. Photocatalytic activity was evaluated by degradation of a methylene blue solution using UV and visible light. TiO2 thin films with each structure irradiated by N+ ions showed the different N concentration in the same N+ ion dose and the chemical state of XPS results suggested that an O atom in TiO2 lattice replaced by an N atom. Therefore the photocatalytic activity of TiO2 thin films was improved under visible light. The maximum photocatalytic activity of TiO2 thin films with each structure was indicated at N concentration of 2.1% for a rutile type, of 1.0% for an anatase type, and of 3.8% for a mixture type under the condition of 2 . 5 × 1 0 1 5  ions/cm2 in N+ ion dose.