Alexander Kromka

Institute of Physics AS CR, v. v. i., Cukrovarnická 10, 16200 Prague, Czech Republic

Alexander Kromka graduated in microelectronics at the Department of Microelectronics, Slovak Technical University in Bratislava, Slovakia, in 1995. In 2001, he received his Ph.D. degree in electronics with main focus on the growth of diamond thin films by an HF CVD technique and was supervised by Dr. S. Bederka. He acquired experience in semiconductor processing during his postdoctoral position at the University of Ulm, Germany. During his short stay at the Institute of Physics ASCR in 2001, he started up the microwave plasma enhanced CVD system for diamond thin film growth at high pressures (up to 250 mbars). In 2002, he joined A.O.T. GmbH company, Austria, where he focused on large area deposition of diamond films by modified HF CVD process. In 2005, he joined the Institute of Physics ASCR, Czech Republic, with the main focus on nucleation/seeding techniques and low temperature growth of diamond films on variety substrates (Si, glass, Al, SiC, etc.). In 2008, he visited the group of Professor Haenen at IMO IMEC, Hasselt, Belgium, where he gained experience in the growth of boron-doped diamond films. Since 2009, he is the Head of Diamond and Carbon nanostructures Laboratory and a J.E. Purkyne Fellow at the Institute of Physics ASCR, Czech Republic. His research activity is focused on the fabrication, characterization, and understanding of the growth of diamond nanostructures and CNTs by focused or linear antenna microwave plasma-assisted CVD processes; material nanostructuring by reactive ion etching; R&D of diamond-based devices; physics and chemistry of diamond seeding/nucleation processes; diamond growth from polymer composites; atomic and molecular functionalization of diamond; and Raman measurements of carbon allotropes. Dr. Kromka is the author and coauthor of 115 scientific articles in internationally peer-reviewed journals, with over 800 paper citations, 6 book chapters, 3 patents, 2 patent applications, and 1 industrial procedure.

Biography Updated on 3 January 2013

Scholarly Contributions [Data Provided by ]